This conference is designed to promote synergies between Hot-Wire Chemical Vapor Deposition researchers working on different materials (semiconductors, metal oxides, organics, etc…) and addressing different applications (solar cells, sensors, industrial coatings, etc…).
HWCVD (also known as Catalytic CVD, Hot Filament CVD, and more recently Initiated CVD) allows to achieve high quality silicon related materials (amorphous, nanocrystalline, polycrystalline and epitaxial), silicon alloys (nitrides, oxides, carbides), passivation coatings, thin film diamond, hard coatings, nanostructured carbon, carbon nanotubes, transition metal oxide nano-particles, and polymers. Device applications of HWCVD films include thin film transistors, solar cells (photovoltaics), light emitting diodes, gas sensors, electrochromic windows, organic devices, and micromechanical structures. Contributions using Hot-Wire chambers for dry etching, surface passivation, or chamber cleaning are also welcome.
Common themes will be process fundamentals (nucleation, coalescence, surface roughening, etc…), technical improvements (filament lifetime, etc…), new developments (process, apparatus), and technology transfer (industrial implementation).
Ecole Polytechnique, Amphitheater Pierre Faure, Palaiseau (near Paris), France
| Call for Abstract | March 01, 2010 | |
| Deadline for abstract submission | April 10, 2010 | |
| Notification of abstract acceptance | May 15, 2010 | |
| Advanced registration for attendees and exhibitions | August 15, 2010 | |
| Deadline for manuscript submission: | July 31, 2010 |
Please submit your abstract consisting of a maximum of 200 words. See the pdf template available on Abstract Submisson. When you submit the abstract, please indicate whether you prefer an oral or poster presentation.
The piano concert will be delivered by Katie Mahan.
[Katie Mahan web site]
Please read the information given below carefully. The deadline date August 15th corresponds to the local French date.
| Advanced Registration before August 15, 2010 (From Jul.5- August.15,2010) |
Registration after August 15, 2010 (From August.16- Sept.17,2010) |
|
| Student |
235 euro | 275 euro |
| Regular (Conference) |
350 euro | 400 euro |
Call for abstract:
March 1, 2010
Abstract submission:
April 10, 2010
Notification of acceptance:
May 15, 2010
Advanced registration:
August 15, 2010
Deadline for manuscript submission:
July 31, 2010